PIPS II System

Precision ion polishing system for precise centering, control, and reproducibility of your milling process.

Advantages Research Spotlight Media Library Publications Resources Back to top
Advantages: 
  • X,Y stage permits alignment of argon beams to region of interest on the sample
  • Improved collimated beam provides useable voltages as low as 100 volts for rapid and damage free preparation of FIB lamella
  • Digital optical imaging with image storage and analysis in DigitalMicrograph® software
  • 10" color touch screen for display and control of all PIPS™ II parameters

Publications

Scientific Reports
2022

Persson, A. R.; Papamichail, A.; Darakchieva, V.

Science Direct
2022

Sun, J.; Ding, D.; Liu, W.; Wu, W.; Liu, H.; Wei, G.; Liu, H.

Virtual and Physical Prototyping
2022

Xi, R.; Jiang, H.; Li, G.; Zhang, Z.; Zhao, G.; Vanmeensel, K.; Kustov, S.; Humbeeck. J. V.; Wang. X.

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