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PIPS II System

Precision ion polishing system for precise centering, control, and reproducibility of your milling process.

  • X,Y stage permits alignment of argon beams to the region of interest on the sample
  • Improved collimated beam provides useable voltages as low as 100 volts for rapid and damage-free preparation of FIB lamella
  • Digital optical imaging with image storage and analysis in DigitalMicrograph® software
  • 10" color touch screen for display and control of all PIPS™ II parameters

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